Nitrogen trifluoride NF3
Applications:Nitrogen trifluoride is used in the plasma etching of silicon wafers. Today nitrogen trifluoride is predominantly employed in the cleaning of the PECVD chambers in the high volume production of liquid crystal displays and silicon-based thin film solar cells. In these applications NF3 is initially broken down in situ, by a plasma. The resulting fluorine atoms are the active cleaning agents that attack the polysilicon, silicon nitride and silicon oxide. Nitrogen trifluoride is also used in hydrogen fluoride and deuterium fluoride lasers, which are types of chemical lasers. It is preferred to fluorine gas due to its convenient handling properties, reflecting its considerable stability.It is compatible with steel and Monel, as well as several plastics.
Synthesis and reactivity:
Nitrogen trifluoride is a rare example of a binary fluoride that can prepared directly from the elements only at very uncommon conditions, such as electric discharge. After first attempting the synthesis in 1903, Otto Ruff prepared nitrogen trifluoride by the electrolysis of a molten mixture of ammonium fluoride and hydrogen fluoride. It proved to be far less reactive than the other nitrogen trihalides nitrogen trichloride, nitrogen tribromide and nitrogen triiodide, all of which are explosive. Alone among the nitrogen trihalides it has a negative enthalpy of formation. Today, it is prepared both by direct reaction of ammonia and fluorine and by a variation of Ruffs method. It is supplied in pressurized cylinders.
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1. Gas products: Argon gas, helium gas, hydrogen gas, Carbon Oxide (CO2), propane gas, acetylene, Nitrous Oxide, LO2, LN2,LCO2. LNG, ect.
2. All kind of high pressure gas cylinder and welded gas cylinders:
Oxygen Cylinder (GB 5099/ ISO 9809-3/ DOT/ EN standard gas cylinders)
Acetylene Gas cylinder
Liquid Chlorine Cylinder/ Liquid Ammonia Cylinder
3. Liquid nitrogen containers: all kinds of liquid nitrogen containers from 2L to 50L
4. Cryogenic Liquid Cylinder : 175L 195L 210L 495L capacity
5. Liquid storage tank: 5M3, 10 M3, 20M3, 30 M3, 50M3, 100M3, 200M3, ect.
6. Gas equipment: Vaporizer, Manifold, Gas filling pump, ect.