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  • Price of Nitrogen Trifluoride Gas NF3

    Product Description:
    Nitrogen trifluoride   NF3     Applications:Nitrogen trifluoride is used in the plasma etching of silicon wafers. Today nitrogen trifluoride is predominantly employed in the cleaning of the PECVD chambers in the high volume production of liquid crystal displays and silicon-based thin film solar cells. In these applications NF3 is initially broken down in situ, by a plasma. The resulting fluorine atoms are the active cleaning agents that attack the polysilicon, silicon nitride and silicon oxide. Nitrogen trifluoride is also used in hydrogen fluoride and deuterium fluoride lasers, which are types of chemical lasers...
    Qingdao Ruiming Blue Sky Energy Co., Ltd.
    Diamond Member Audited Supplier
    China ISO 9001, ANSI/ESD...more
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  • NF3, Nitrogen Trifluoride, Liquid Gas, 99.99~99.999%

    Product Description:
    Nitrogen trifluoride   NF3     Applications:Nitrogen trifluoride is used in the plasma etching of silicon wafers. Today nitrogen trifluoride is predominantly employed in the cleaning of the PECVD chambers in the high volume production of liquid crystal displays and silicon-based thin film solar cells. In these applications NF3 is initially broken down in situ, by a plasma. The resulting fluorine atoms are the active cleaning agents that attack the polysilicon, silicon nitride and silicon oxide. Nitrogen trifluoride is also used in hydrogen fluoride and deuterium fluoride lasers, which are types of chemical lasers...
    Qingdao Ruiming Blue Sky Energy Co., Ltd.
    Diamond Member Audited Supplier
    China ISO 9001, ANSI/ESD...more
    Contact Now
  • High Purity 99.999% Nitrogen Trifluoride Gas NF3

    Product Description:
    Nitrogen trifluoride   NF3     CAS:7783-54-2Applications:Nitrogen trifluoride is used in the plasma etching of silicon wafers. Today nitrogen trifluoride is predominantly employed in the cleaning of the PECVD chambers in the high volume production of liquid crystal displays and silicon-based thin film solar cells. In these applications NF3 is initially broken down in situ, by a plasma. The resulting fluorine atoms are the active cleaning agents that attack the polysilicon, silicon nitride and silicon oxide. Nitrogen trifluoride is also used in hydrogen fluoride and deuterium fluoride lasers, which are types of ch...
    Qingdao Ruiming Blue Sky Energy Co., Ltd.
    Diamond Member Audited Supplier
    China ISO 9001, ANSI/ESD...more
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  • Caustic Soda (NaOH) 30%-50% Lye

    Product Description:
    Caustic Soda CAS No. : 1310-73-2EINICS NO.: 215-185-5HAZARD CLASS: 8UN NO.: 1824Molecular Formula: NaOHAlias:Sodium Hydroxide, LyePurity: 30% 32% 42% 48% 50%                                                                                  Appearance: Colorless Transparent LiquidGrade Standard: Industrial Grade, Reagent Grade  Usage:Sodium hydroxide is a popular strong base used in industry. Around ...
    Shijiazhuang Xinlongwei Chemical Co., Ltd.
    Diamond Member Audited Supplier
    China ISO 9001, ANSI/ESD...more
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